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322. PTB-Seminar "VUV and EUV Metrology" 2023322. PTB-Seminar "VUV and EUV Metrology" 2023

Programme

Monday, November 13
PTB Berlin-Adlershof, Willy-Wien-Laboratory, Magnusstr. 9, 12489 Berlin

Due to administrative regulations on radiation protection you need to be registered prior to this event.

16:00 Introduction: PTB in Adlershof
MLS Lecture Hall
16:20 Lab Tour
MLS Experimental Hall
17:00 Welcome Reception & Discussion
MLS Lecture Hall
Tuesday, November 14
PTB Berlin-Charlottenburg, Hermann-von-Helmholtz-Building, Abbestr. 2-12, 10587 Berlin
8:30 Registration & Poster Set-up & Coffee
9:30 Opening and overview
A. Gottwald, M. Kolbe, F. Scholze, PTB
9:50 Optics for EUV-Lithography with high NA
H. Enkisch, CZ-SMT
  Short Technical Break

Session I

Chair: F. Scholze
10:40 Actinic EUV Metrology and Materials Characterization for the EUV Era in imec's AttoLab
K. M. Dorney, IMEC vzw
11:00 EUV coherent scattering for wafer metrology
Y. Ekinci, PSI
11:20 Soft x-ray: novel metrology for 3D profilometry and device pitch overlay
H.-K. Nienhuys, ASML
11:40 How does solid microanalysis profit from innovations in EUV research
A. Winckelmann, BAM
12:00 Conference Photo
12:10 Lunch Break
13:00 Poster session & Sponsor Presentation

Session II

Chair: A. Gottwald
14:20 SiC-based photodiode with shallow emitter for radiation measurements below 200nm
N. Papathanasiou, sglux GmbH
14:40 Evaluation of a laboratory-based EUV scatterometer for nanoscale grating characterization
L. M. Lohr, PTB
15:00 FUV coatings based an AlF3 films
J. I. Larruquert, CSIC
15:20 Irradiation Systems for accelerated Testing of EUVL Components
J. Vieker, ILT
15:40 Lab-based EUV spectroscopy : A guide from data acquisition to the reconstructed sample
S. Glabisch, RWTH
16:00 Coffee Break
16:30 SPECIAL SESSION on 40 Years of Radiometry With Synchrotron Radiation at PTB
  Welcome by the President of PTB
C. Denz, PTB
  40 Years of Metrology with Synchrotron Radiation at PTB
M. Richter, PTB
  Towards A Materials Discovery Facility BESSY III
B. Rech, HZB
18:00 Get Together Reception and Buffet Dinner
Wednesday, November 15
PTB Berlin-Charlottenburg, Hermann-von-Helmholtz-Building, Abbestr. 2-12, 10587 Berlin
8:30 Morning Coffee
9:00 Sub-10 nm EUV Lithography at 1000 W power
M. van de Kerkhof, ASML

Session IV

Chair: M. Kolbe
9:40 10 years of EUV multilayer design, fabrication and characterization - a retrospective
T. Feigl, optiXfab
10:00 In-situ x-ray characterization of thin films at high temperatures
M. Störmer, Hereon
10:20 Coffee Break

Session V

Chair: C. Laubis
10:50 The development and metrology of the heliospheric Lyman-a photometer IMAP/GLOWS
M. Bzowski, PAN CBK
11:10 Wafer metrology via automatic differentiation-based reflection ptychography on a EUV High Harmonic Generation platform
S. Weerdenburg, Delft U
11:30 Chemically sensitive ptychographic imaging of nanoscale 3D objects
V. Krasnov, IMEC
11:50 Ultra-shallow large area EUV-diffraction gratings for near normal incidence
J. Kaufmann, IAP Jena
12:10 The interface study of photoresist/underlayer using hybrid x-ray reflectivity and x-ray standing wave approach
A .Tiwari, MESA+
12:30 Lunch Break

Session VI

Chair: M. Krumrey
13:30 Modeling the Sensitivity of Optical Inspection
K. Virk, KLA
13:50 Theory and Instrumentation for LIXS
D. Bleiner, EMPA
14:10 Table-Top System for High-Resolution Soft X-ray Absorption Spectroscopy
J. Holburg, Ifnano
14:30 Nanostructures studied by AFM and EUV scatterometry
L. Ying, NSRL
14:50 Wrap Up & Closing of the Seminar
A. Gottwald, M. Kolbe, PTB
Posters
Tuesday Nov 14 after lunch
Poster session
P01 Partial Cross Sections of Methane from Photoemission Spectroscopy with Synchrotron Radiation
H. Kirschner, PTB
P02 Autocorrelation functions of periodic patterns in soft X-ray metrology of semiconductor devices
H.-K. Nienhuys, ASML
P03 Prospects for laboratory-based low-Z spectroscopy with a polycapillary optic and a curved reflection zone plate
Ch. Braig, IAP Adlershof
P04 Mitigation of polarization-dependent uncertainties in a compact EUV spectrometer
S. Schröder, RWTH Aachen
P05 Electron beam generated hydrogen plasma for material testing and cleaning
T. W. Mechielsen, TNO
P06 Highly-Sensitive Ultraviolet Photoelectron Yield Spectroscopy: A versatile technique for materials analytics
D. Menzel, HZB
P07 Design of a compact spectrograph for the spectral characterization in the EUV to VUV wavelength range
I. Gisch, RWTH
P08 High transmission tender X-ray energy range monochromator based on Multilayer-coated blazed grating
A. Sokolov, HZB
P09 Development and characterization of an EUV/soft X-ray Single-Photon Sensitive sCMOS camera
N. Abdurakhimov, greateyes
P10 Fitting a complex layer stack: Optical constants and interlayer roughness from soft X-ray measurements
R. Ciesielski, PTB
P11 Development of tender X-ray (1-5 keV) high-order multilayer coated gratings
Y. Zhuang, Tongji U.
P12 Laboratory based sources and advanced reflection zone plate optics for ultrafast soft X-ray spectroscopy in the water window and at transition metal L-edges
H. Stiel, MBI